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![LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors](https://www.pdfplace.org/6620-large_default/la-74-10-4-the-approach-to-quotclass-10quot-clean-rooms-for-the-manufacture-of-semiconductors64.jpg "LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors")
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LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors
M00000230
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LA-74-10-4 -- The Approach to "Class 10" Clean Rooms for the Manufacture of Semiconductors
Conference Proceeding by ASHRAE, 1974
Dennis L. Merkel
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Airborne particulates in the production of small semiconductor devices can cause a poor quality product, or a device that fails completely. Another example of problems caused by particulate matter would be a very large defect in a portion of an integrated circuit chip. Air cleanliness, therefore, is a very important part in the manufaoture of miniature devices, and the use of clean rooms is highly desirable.
A "Class 10" clean room which 1s what is being approached by our most recently built room, would have a particle count which does not exceed 10 particles per cubic foot 0.5 micron and larger, and no more than 1 particle per oubic foot 1.0 micron and larger. This new classification is a proposed addition to the Federal Standard and will classify the excellent air cleanliness conditions that are now being approached.
Citation: Symposium, ASHRAE Transactions, Volume 80, Part 1, Los Angeles, CA